The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 1990
Filed:
Oct. 27, 1989
Hans-Werner Fink, Gattikon, CH;
Roger Morin, Marseilles, FR;
Heinz Schmid, Oberrieden, CH;
Werner Stocker, Wadenswil, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single atom or a trimer of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electrons beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold. The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is <2.degree.. If the source is operated in an ultra-high vacuum, the particle beam ( 4) will consist of free electrons, whereas, if the source is operated in a noble-gas atmosphere, the beam (4) will consist of noble-gas ions. Both, the electron beam, as well as the ion beam, contains particles of a very low frequency.