The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 1990
Filed:
Mar. 07, 1989
Applicant:
Inventors:
Jeffrey W Carr, Fishkill, NY (US);
Lawrence D David, Wappingers Falls, NY (US);
William L Guthrie, Hopewell Junction, NY (US);
Frank B Kaufman, Amawalk, NY (US);
William J Patrick, Newburgh, NY (US);
Kenneth P Rodbell, Poughkeepsie, NY (US);
Robert W Pasco, Wappingers Falls, NY (US);
Anton Nenadic, Red Hook, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09C / ;
U.S. Cl.
CPC ...
51309 ; 51293 ; 106-3 ;
Abstract
Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps;
Carr, Jeffrey. (1990). Method of chemical-mechanical polishing an electronic component (U.S. Patent No. 4954142). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4954142
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile