The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 1990
Filed:
Jun. 15, 1989
Ralph A Logan, Morristown, NJ (US);
Tawee Tanbun-ek, Summit, NJ (US);
Henryk Temkin, Berkeley Heights, NJ (US);
AT&T Bell Laboratories, Murray Hill, NJ (US);
Abstract
Described is a method for forming epitaxial films comprising successive layers of at least ternary and at least quaternary III-V material grown by metalorganic vapor-phase epitaxy. Between the steps of growing successive layers, the growth chamber is first flushed, advantageously in successive steps using a pair of gaseous Group V hybrides, a few monolayers of binary III-V material are then deposited, and then the growth chamber is again flushed. As a result, interfaces are sharper and interfacial defects are reduced. Also described are quantum well lasers made according to the inventive method.