The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 1990
Filed:
Oct. 07, 1988
Jerald S Bradshaw, Provo, UT (US);
Maria Bochenska, Gdansk, PL;
Krzysztof E Krakowiak, Provo, UT (US);
Jan F Biernat, Gdansk-Wrzeszcz, PL;
Bryon J Tarbet, Provo, UT (US);
Ronald L Bruening, Provo, UT (US);
Reed M Izatt, Provo, UT (US);
Brigham Young University, Provo, UT (US);
Abstract
The process of the invention comprises removing and concentrating certain ions, such as the transition metal ions, from solutions thereof admixed with other ions which may be present in much higher concentrations by forming a complex of the desired ion(s) with a compound ##STR1## B and D are each a radical selected from the group of N(R.sup.3), N(R.sup.3)CH.sub.2, O, OCH.sub.2, S and SCH.sub.2, but B or D must be N(R.sup.3) or N(R.sup.3)CH.sub.2 ; E is a radical selected from the group consisting of H, NH(R.sup.3), SH, OH, lower alkyl, and Y and Z are radicals selected from the group of Cl, OCH.sub.3, OC.sub.2 H.sub.5, methyl, ethyl and halogenated substituents thereof, and O-matrix; R.sup.1 is a radical selected from the group consisting of H, SH, OH, lower alkyl and aryl such as phenyl, naphthyl and pyridyl; R.sup.2 is a radical selected from the group consisting of H or lower alkyl; R.sup.3 is a radical selected from the group consisting of H, lower alkyl and aryl such as phenyl, naphthyl and pyridyl; a=2 to about 10; b=1; c=1 to about 2000; d=0 to about 2000.