The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 1990

Filed:

Apr. 14, 1989
Applicant:
Inventors:

Hidetsugu Kawabata, Hirakata, JP;

Yoshihiko Kudoh, Yawata, JP;

Motoyoshi Murakami, Hirakata, JP;

Norio Miyatake, Kobe, JP;

Masakazu Yamamoto, Kawanishi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419215 ; 20419216 ; 20419223 ;
Abstract

In a method of producing a deposition film of a composite material, a plurality of sputtering targets each containing one of a plurality of different components are disposed separately in a vacuum chamber. A substrate is subjected to sputtering from the sputtering targets while being moved at an adequately high speed relative to a deposition rate from each sputtering target so that extremely thin layers of the respective components are sequentially stacked repeatedly a plurality of times to thereby form a deposition film of a composite material in which the plurality of different components are mixed uniformly.


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