The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 1990
Filed:
May. 16, 1988
Applicant:
Inventors:
Takashi Inuzima, Atsugi, JP;
Shigenori Hayashi, Atsugi, JP;
Toru Takayama, Atsugi, JP;
Seiichi Odaka, Akita, JP;
Naoki Hirose, Atsugi, JP;
Assignee:
Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437235 ; 148D / ; 148D / ; 148D / ; 427 531 ; 437170 ; 437173 ; 437238 ; 437241 ; 437978 ; 437925 ;
Abstract
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light source for photo CVD or a pair of electrode for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light or plasma evenly throughout the surfaces to be coated.
Published as:
EP0260097A1; CN87106283A; KR880004128A; US4950624A; KR910003742B1; EP0490883A1; EP0260097B1; DE3782991D1; DE3782991T2; CN1020290C; US6013338A; US6520189B1; US2003140941A1;