The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 1990

Filed:

May. 02, 1989
Applicant:
Inventors:

Yuuji Ichinose, Hitachi, JP;

Fuminobu Takahashi, Katsuta, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ; G01N / ;
U.S. Cl.
CPC ...
356141 ; 356-4 ; 356-5 ; 356152 ; 356342 ;
Abstract

A method and an apparatus are disclosed in which paying attention to the fact that the rate of attenuation of laser lilght propagating in the atmosphere changes depending on meteorological conditions, the rate of attenuation is detected and the optimum laser beam emission or divergence angle is controlled in accordance with the detected rate of attenuation. There are also disclosed a method and an apparatus in which the optimum beam angle is controlled in accordance with a distance to a target existing in the atmosphere or the shape of the target. Further, there are disclosed a method and an apparatus in which the optimum beam angle is controlled taking either two or all of the rate of attenuation, the distance to the target and the shape of the target into consideration.


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