The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 1990
Filed:
Apr. 10, 1989
Douglas W Townsend, Glen Burnie, MD (US);
Duane O Terry, Glen Burnie, MD (US);
Radon Appliances, Inc., Glen Burnie, MD (US);
Abstract
A protective system (10) is provided for preventing deleterious gases from entering the internal atmosphere (34) of a building structure (12) derived from surrounding ground environments (14 and 18). An enclosure (24) is mounted above a sump (26) containing a sump pump (30) for discharging liquid (32) to an external environment (22) when taken with respect to building structure (12). Mounted adjacent to the enclosure (24) is a fan mechanism (52) for drawing a partial vacuum in an enclosure chamber (28 and 28'). The fan mechanism (52) is in fluid communication with a gas discharge pipe (58) for passing or displacing contaminated gas into the external atmosphere (22). Radon contaminated gas passes through perforated drainage pipes (48) into sump (26) and due to the negative pressure gradient created by fan mechanism (52), radon contaminated gas is displaced through gas discharge pipe (58) to the external atmosphere (22). The enclosure (24) and couplings thereto are formed in substantially airtight relation and thus, the contaminated gas being drawn from enclosure chambers (28 and 28') is not directed into the building structure internal atmosphere (34), but displaced directly to the external atmosphere (22).