The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 1990

Filed:

Jul. 13, 1988
Applicant:
Inventors:

Tohru Taguchi, Iwakuni, JP;

Yurimasa Zenitani, Saiki, JP;

Akio Ikeda, Ohtake, JP;

Toshiji Nishimura, Iwakuni, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528339 ; 528338 ; 528340 ; 528347 ;
Abstract

A polyamide comprising from 60 to 100% by mole of divalent terephthaloylalkylenediamine constituent units (a), from 0 to 40% by mole of divalent diacyloylalkylenediamine constituent units (b) and from 0.1 to 5% by mole of trivalent diacyloylalkylenediamine units (c), said constituent units (a), (b) and (c) being arranged at random to provide a branched linear structure, said polyamide being free from a gel-forming cross-linked structure and soluble in concentrated sulfuric acid and having: an intrinsic viscosity [.eta.] of from 0.5 to 3 dl/g, as measured in concentrated sulfuric acid at a temperature of 30.degree. C., a melting point of from 280.degree. C. to 370.degree. C. and a glass transition temperature of from 100.degree. C. to 160.degree. C., as measured by means of a differential scanning calorimeter at a heating rate of 10.degree. C./min., and a crystallinity of from 10 to 30%, as measured by X-ray diffractometry. The polyamide has an excellent gas-barrier property, and thus, it is useful in applications where a gas-barrier property is particularly required, alone or in blend or lamination with other melt-moldable polymers.


Find Patent Forward Citations

Loading…