The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 1990
Filed:
Feb. 02, 1989
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for producing a thin-film magnetic recording medium having an improved corrosion resistance and which permits production of the medium at a high speed. A magnetic material vapor flow from an evaporation source and a gas or ion flow are applied to a nonmagnetic base in an evaporation chamber and the two flows reacted with each other to form the thin-film magnetic layer on the nonmagnetic base. During this process, the expression P.sub.1 /P.sub.0 .ltoreq.0.1 is maintained, wherein P.sub.0 represents the degree of vacuum in the evaporation chamber, under a first condition where only the gas or ion flow is applied after the pressure in the chamber has been reduced to a predetermined degree of vacuum, and P.sub.1 represents the degree of vacuum in the chamber under a second condition where the magnetic material vapor flow is applied to the nonmagnetic base simultaneously with the gas or ion flow. The rate of formation of the thin-film magnetic layer is 200 .ANG./sec or more on the average.