The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 1990

Filed:

Dec. 22, 1986
Applicant:
Inventors:

Roland L Halm, Madison, IN (US);

Oliver K Wilding, Jr, Louisville, KY (US);

Assignee:

Dow Corning Corporation, Midland, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
556472 ;
Abstract

This invention discloses a method of treating silicon with non-volatile, phosphorous compounds to allow the silicon to be used in the direct process for the manufacture of alkylhalosilanes. The treatment of the silicon is carried out by feeding phosphorous compounds to the silicon during or after refining.


Find Patent Forward Citations

Halm, Roland. (1990). Method of direct process performance improvement via control of silicon (U.S. Patent No. 4946978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4946978

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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