The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 1990
Filed:
Dec. 09, 1988
Maurice Michon, Draveil, FR;
Paul Rigny, Sceaux, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
Apparatus for the distribution of laser beams used during a selective reaction in a process for isotope separation by lasers. The system comprises in an enclosure (10), a material in the form of a vapor flow, from which it is wished to extract one species, and laser sources (12) supplying pulses along beams S1 . . . Sn at selective excitation wavelengths .lambda.1 . . . .lambda.n and along a beam St at wavelength .lambda.t permitting a transforming of said excited species. The system incorporates partial reflection mirrors (Mi) arranged in such a way that the transmitted and reflected beams S1 . . . Sn, St are superimposed. A first part (P1) of these beams is directed to the enclosure and a second part (P2) to the mirror (Mi+1). Return means (14) make it possible to adjust the length of the path in enclosure (10) between two mirrors (Mi) and (Mi+1).