The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 1990
Filed:
Oct. 04, 1988
Hiroshi Kawabata, Yokohamashi, JP;
Katsuhiko Kobayashi, Yokohamashi, JP;
Hideo Sato, Yokohamashi, JP;
Chisso Corporation, Osaka, JP;
Abstract
A photocurable resin composition is described, which comprises a specific type of photosensitive polymer obtained by copolymerization of a monomer of the following general formula [I] ##STR1## in which R.sup.1 represents H, CH.sub.3 or C.sub.2 H.sub.5, X represents --O-- or --NH--, Y represents a linear or branched hydrocarbon group having from 1 to 4 carbon atoms, and .PHI. represents ##STR2## Z.sup..crclbar., in which Z.sup..crclbar. represents an anion, and R.sup.2, R.sup.3 and R.sup.4 are independently an alkyl group having from 1 to 4 carbon atoms, and a monomer of the following general formula [II] ##STR3## in which R.sup.5 represents H, CH.sub.3 or C.sub.2 H.sub.5, and n and x are independently an integer of from 1 to 4. The photosensitive polymer is photocrosslinked with a diazide compound. The resin composition is particularly suitably for use in formation of a color filter because of good dyeability and good adhesion to a substrate.