The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 1990

Filed:

Oct. 31, 1989
Applicant:
Inventors:

Fred Y Kafka, Louisville, KY (US);

Archie R Bice, Landenberg, PA (US);

Donald K Burchett, Louisville, KY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ; B29C / ;
U.S. Cl.
CPC ...
264141 ; 34 14 ; 34 36 ; 34164 ; 26421123 ; 264232 ; 264234 ; 264344 ; 425204 ; 425209 ; 526 71 ; 528483 ; 528502 ;
Abstract

Removing chloroprene dimers from polychloroprene by feeding to a screw extruder a polychloroprene latex and coagulating the latex in the extruder, feeding the coagulated latex to a dewatering zone and discharging the coagulated polychloroprene through a flow restriction which heats and pressurizes the polychloroprene to an area of reduced pressure to form a porous crumb. Also, the flow restriction applies back pressure sufficient that the water in the polychloroprene is forced out of a vent port. The polychloroprene crumb discharged from the extruder is heated to strip chloroprene dimer therefrom.


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Kafka, Fred. (1990). Process for removing chloroprene dimers from polychloroprene (U.S. Patent No. 4943402). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4943402

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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