The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 1990

Filed:

Oct. 31, 1989
Applicant:
Inventors:

Edward J Murphy, Des Plaines, IL (US);

Robert E Ansel, Hoffman Estates, IL (US);

John J Krajewski, Wheeling, IL (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ; C08F / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
264 22 ; 264236 ; 264344 ; 264347 ; 430286 ; 522 44 ; 522 46 ; 522 96 ; 522116 ; 522120 ; 522182 ; 526227 ; 526232 ; 526264 ; 5263297 ;
Abstract

A stereolithographic method which employs an ultraviolet-curable liquid composition adapted to cure rapidly to a lightly cross-linked solvent-swellable three-dimensional complexly-shaped polymeric thin-walled element constituted by heat-softenable solid polymer upon exposure to ultraviolet dosage in the range of about 0.1 to about 10 Joules per square centimeter and which possesses reduced distortion comprises, from 20 to 80 weight percent, of a resinous polyacrylate or polymethacrylate dissolved in a combination of 10 to 45 weight percent of a liquid polyacrylate or polymethacrylate, which is preferably trifunctional, and 10 to 45 weight percent of liquid N-vinyl monomer, preferably N-vinyl pyrrolidone. Thus, the weight ratio of polyacrylate: polymethacrylate: N-vinyl monomer is about 1:2:2 to about 8:1:1. One of the foregoing polyacrylates or polymethacrylates is a polyacrylate and the other is a polymethacrylate so that good cure speed is accompanied by good distortion resistance. In the method, a reservoir of the liquid composition is established and its exposed surface is irradiated to solidify the surface and build up a thin-walled element which is removed from the reservoir, drained of liquid adhering thereto and cured.


Find Patent Forward Citations

Loading…