The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 1990
Filed:
Feb. 07, 1989
Morito Matsuoka, Katsuta, JP;
Ken'ichi Ono, Mito, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Abstract
A thin film forming apparatus comprising a plasma generating chamber into which is introduced a gas to generate plasma; a first target and a second target which are made of a material to be sputtered and are disposed in the vicinity of both end portions of interior of the plasma generating chamber, respectively, at least one of the first and second targets having the form of a cylinder; at least one power supply for applying a negative potential to the first and second targets; an electromagnet adapted to establish the magnetic field within the plasma generating chamber and inducing the magnetic flux leaving one of the first and second targets and entering the other; and a specimen chamber which incorporates therein a substrate holder and is communicated to one end of the plasma generating chamber on the side of the cylindrical target. High density plasma generated in the plasma generating chamber sputters the targets so that sputtered substances which constituted the targets are deposited over the surface of a substrate, thereby forming a thin film.