The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 1990
Filed:
Apr. 25, 1988
Kazuhiro Watanabe, Ibaragi, JP;
Kazuya Saito, Ibaragi, JP;
Yoshiyuki Yuchi, Ibaragi, JP;
Konosuke Inagawa, Ibaragi, JP;
Nihon Sinku Gijutsu Kabusiki Kaisha, Chigasaki, JP;
Abstract
An apparatus for forming a reactive deposition film includes a member for supporting a body to be coated in a vacuum chamber; an evaporation source of element constituting the reactive deposition film; apparatus for introducing a reaction gas into the vacuum chamber; bias apparatus for applying a high frequency or radio frequency (rf) bias voltage to the body; an electron beam generator for supplying electron beams towards the body; and a magnetic field generator which generates such a magnetic field that distributes the electron beams supplied from the electron beam generator uniformly to the whole region adjacent to the surface of the body and traps electrons from the electron beams in the region, whereby plasma of high density can be formed uniformly in the whole region adjacent to the surface of the body. In another apparatus, further a second bias apparatus for applying a DC (direct current) bias voltage or AC (alternate current) bias voltage to the gas introducing apparatus for activating the reaction is provided.