The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 1990

Filed:

May. 23, 1989
Applicant:
Inventors:

Jorg Kieser, Albstadt, DE;

Michael Geisler, Wachtersbach, DE;

Rolf Wilhelm, Calw-Stammheim, DE;

Eberhard Rauchle, Remseck, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
31511121 ; 315 39 ; 31511141 ; 315-35 ;
Abstract

The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.


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Kieser, Jorg. (1990). Apparatus for producing a plasma and for the treatment of substrates (U.S. Patent No. 4939424). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4939424

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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