The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 1990
Filed:
Oct. 21, 1988
Tamotu Nakajima, Shiga, JP;
Shusuke Yoshida, Otsu, JP;
Toray Industries, Inc., Tokyo, JP;
Abstract
The present invention relates to a new fabric which is rich in a new, raw material feeling which has been unparalleled before, a fashionable feeling and an unexpected feeling and to its method of preparation. The fabric of the present invention is a three dimensional fabric having a unique structure characterized by a structure wherein a mass of a number of apexes of piled fibers is made in a body to form a scaly structure and a number of said scaly structures cover the surface layer of the fabric. Moreover, the method for preparing the three dimensional fibrous fabric of the present invention is characterized by the method wherein the piled layer of a piled fabric having a lot of piles made of fibers is treated by a pressing treatment under heating and compression to adhere the piled surface layer being formed with the apexes of piles over a wide area and to make thereby it in a body with a film-shape, and thereafter a lot of scaly structures are formed by crumpling the said fabric and by splitting the above described film-shaped monolithic structure into units of small area. The three dimensional fabric of the present invention can be widely used in such various applications as outer wears and so on by utilizing its new, raw material feeling, unexpected feeling and fashionable characteristic.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile