The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 1990
Filed:
Dec. 19, 1988
David M Camm, Vancouver, CA;
Arne Kjorvel, Vancouver, CA;
Anthony J Housden, North Vancouver, CA;
Nicholas P Halpin, Vancouver, CA;
Dean A Parfeniuk, Vancouver, CA;
Andy J Frenz, Vancouver, CA;
Vortek Industries Ltd., Vancouver, CA;
Abstract
An apparatus for producing high intensity radiation has electrodes positioned within an elongated cylindrical arc chamber across which an arc discharge can be established. Liquid is injected into the arc chamber to produce a vortex motion therein to form a cylindrical liquid wall adjacent to the chamber, which constricts the arc by cooling an outer periphery thereof. Gas is injected into the arc chamber to produce a vortex motion adjacent the cylindrical liquid wall. An exhaust structure actively exhausts the liquid and gas from the arc chamber to reduce turbulence and restriction of fluid. This permits attainment of higher flux densities in the arc, and/or extension of electrode life. Preferably, the liquid and gas are exhausted actively by means of an ejector pump which ejects pressurized liquid into the gas and liquid leaving the arc chamber. The ejector pump pressurizes the exhausted gas and liquid sufficiently to permit the gas to be separated and recycled back to the arc chamber, without requiring an additional compressor to increase gas pressure.