The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 1990

Filed:

Oct. 26, 1989
Applicant:
Inventors:

Ken-ichi Kawasumi, Ome, JP;

Akio Funagoshi, Tachikawa, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 156645 ; 156662 ; 34 36 ; 34 58 ; 134-1 ; 134 31 ;
Abstract

An equipment for surface treatment according to the present invention comprises a chamber capable of exhausting gas, a revolving stage disposed in said chamber for placing a material to be treated thereon, a quartz plate serving as a gap controlling means spaced from the material to be treated such that a gap between said revolving stage and said material to be treated is provided not to exceed 0.5 mm for forming a space of treatment, the quartz plate being provided with a gas supplying means for supplying a reactive gas containing oxygen into the space of treatment, and a gas exciting means provided on the a side of said quartz plate opposite that on which the material to be treated is located for exciting the oxygen contained in said reactive gas into metastable oxygen atoms.


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