The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 1990

Filed:

May. 06, 1988
Applicant:
Inventors:

Hideyuki Imazaki, Osaka, JP;

Masazumi Fujikawa, Osaka, JP;

Katsuaki Oba, Shiga, JP;

Fusaharu Kumayama, Mie, JP;

Toshio Takahashi, Hyogo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ; A01N / ;
U.S. Cl.
CPC ...
514 63 ; 514 95 ; 514109 ; 514189 ; 514493 ; 556 12 ; 556 25 ; 556 24 ; 556 32 ; 556 38 ; 556 84 ; 556 86 ; 556 88 ; 556 94 ; 544181 ; 549-3 ; 548103 ;
Abstract

A compound of the formula: ##STR1## in which R.sup.1 represents alkyl, cycloalkyl or aralkyl, R* represents fluorophenyl or trifluoromethylphenyl when R.sup.1 is alkyl; R* represents dichlorophenyl, neopentyl, trimethylsilylmethyl, dimethylphenylsilylmethyl or a group of the formula: ##STR2## wherein R.sup.2 represents halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is cycloalkyl; or R* represents 2-thienyl, 3-thienyl, neopentyl, trimethylsilylmethyl, dimethylphenylsilylmethyl or a group of the formula: ##STR3## wherein R.sup.3, R.sup.4 and R.sup.5 independently represent halogen, trifluoromethyl, lower alkyl or lower alkoxy when R.sup.1 is aralkyl, m represents 1 or 2, and X represents halogen, imidazolyl, triazolyl, phenylthio or a radical selected from the group consisting of: ##STR4## wherein R.sup.6 represents alkyl, R.sup.7 and R.sup.8 independently represent lower alkyl and R.sup.9 and R.sup.10 independently represent hydrogen or lower alkyl when m is 1; or they independently represent oxygen, sulfur or a radical selected from: ##STR5## A process for preparing the compound (I) and a pesticidal composition containing the compound (I) are also provided.


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