The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 1990
Filed:
Sep. 21, 1988
Todd L Siler, Cambridge, MA (US);
Other;
Abstract
A process for providing a design patterns in a material wherein a selected medium is applied to the material, the material being positioned adjacent a surface of a template which surface has selected surface characteristics either topographical or non-topographical in nature. The material is held against the template surface at a selected pressure and for a selected time period, at least a portion of the medium coming into contact with the template surface, the adhesive and conesive forces of the material, the medium, and the template interacting with each other to generate a unique design relief pattern on the surface of the material which pattern differs from the pattern characteristics of the template. The material is then suitably dried. The viscosity and amount of the medium, as well as the pressure used, are selected to lie within specified ranges to produce heavy or light relief patterns on permeable or non-permeable materials.