The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1990
Filed:
Apr. 13, 1989
Perry W Frogge, Palm Bay, FL (US);
Harris Corporation, Melbourne, FL (US);
Abstract
An enhanced current mirror circuit includes an auxiliary (by-pass) transducer that is effectively coupled in parallel with the current regulation transistor and the gate voltage of which is controlled by a (doped polysilicon) resistor voltage divider. The components of the voltage divider are configured to compensate for a reduction in the size of the principal current control resistor in the current regulation path of the mirror. The auxiliary current (bypass) control circuit effectively compensates for variations in parameters of the components of the current mirror circuit by controllably regulating (bypassing) current that would otherwise flow through the mirror's current control transistor. The voltage divider network is preferably comprised of a plurality of polysilicon resistor elements the configuration of one of which corresponds to the configuration of the principal current control resistor element. The width of another of the resistor elements of the voltage divider network is relatively large. As a result of these resistance parameters, output signal levels are essentially unaffected by material and dimensional changes. Also, the channel length of the bypass control transistor is shorter than that of the current control transistor in order to enhance its sensitivity to manufacturing and operational changes.