The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1990
Filed:
Apr. 21, 1989
Applicant:
Inventors:
Teruyuki Ninomiya, Kurashiki, JP;
Tomiyoshi Furuta, Kurashiki, JP;
Seiji Kita, Kurashiki, JP;
Yoshimi Fujii, Kurashiki, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
568862 ; 568853 ; 568863 ;
Abstract
A process for production of neopentyl glycol by hydrogenation of hydroxypivaldehyde in the presence of a Pt-Ru-W catalyst. This catalyst exhibits high activity and selectivity, and further has a long life. Neopentyl glycol is an important intermediate for use in production of a wide variety of chemicals.
Quick Actions:
Ninomiya, Teruyuki. (1990). Process for producing neopentyl glycol (U.S. Patent No. 4933473). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4933473
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile