The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 1990

Filed:

Jan. 27, 1989
Applicant:
Inventors:

Donald R Scifres, San Jose, CA (US);

David Welch, San Jose, CA (US);

Peter Cross, Palo Alto, CA (US);

William Streifer, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437129 ; 148D / ; 148D / ; 148D / ; 437 22 ; 437133 ; 437987 ;
Abstract

A method of making semiconductor laser arrays having an impurity disordered pattern of waveguides at least some of which are directly joined at branching junctions. The region near the branching junctions provides a phase boundary condition in which lightwaves propagating in adjacent waveguides are in phase. Using one impurity dose and one disordering depth in a first portion of the pattern and another in a second portion of the pattern provides a combination of strong and weak waveguiding with strong waveguides that eliminate evanescent coupling from occurring at least in the branching junction regions, and with weak guides near one or both end facets permitting evanescent coupling. The evanescent coupling between adjacent weak waveguides preserves the in phase relationship that was established in the Y-junction regions, resulting in a diffraction limited single lobe far field output. Alternatively, even without evanescent coupling, the modes can adjust their phases in the weak waveguides, where the propagation constant is less tightly specified by the geometry.


Find Patent Forward Citations

Loading…