The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 1990

Filed:

Apr. 25, 1988
Applicant:
Inventors:

Etienne Vansant, Zoersel, BE;

Guido Peeters, Antwerp, BE;

Paul De Bievre, Kasterlee, BE;

Remi Van Gompel, Geel, BE;

Giamcarlo Pierini, Varese, IT;

Heinz Dworschak, Cardana di Besozzo (Va), IT;

Assignee:

European Atomic Energy Community (EURATOM), Plateau du Kirchberg, LU;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; B01D / ; C01B / ;
U.S. Cl.
CPC ...
423488 ; 423210 ;
Abstract

The invention concerns a process for ultra-drying of a gas or gas mixture by bringing this into contact with a silicate containing material. In order to obtain a residual water level of 5 ppb or less, the invention is characterized in that the gas or gas mixture is brought into contact with a silcate containing material, preferably a zeolite or silicagel, that has been modified with silane, borane, and/or the alkyl and/or halogen substituted compounds thereof. The invention is further concerned with the separation of tritium oxide from gas mixtures preferably with water.


Find Patent Forward Citations

Vansant, Etienne. (1990). Process for ultradrying of a gas (U.S. Patent No. 4933162). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4933162

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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