The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1990
Filed:
Dec. 06, 1988
Reiner Seiler, Hanau, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
In an apparatus for applying materials to a substrate (15) disposed in a vacuum chamber (17), having an electron emitter (9) and having magnet coils (30, 39) disposed outside of the vacuum chamber (16, 17), the electron emitter (9) is disposed in a separate generator chamber (37) communicating with the vacuum chamber (17) and forming the anode (11) and, after the introduction of the process gas into the generator chamber (37), produces a large-area plasma jet (S) which, under the action of magnets (12, 21), passes through an opening (25) in the wall (28) of the vacuum tank (1) forming the vacuum chamber (16, 17). The positive ions are accelerated, by application of a variable negative voltage, from the plasma jet (S) onto the target (7) of drum-shaped configuration mounted in the vacuum chamber (17) for rotation on a pedestal (24), from which target the sputtered metal atoms are deflected onto the substrate (15).