The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1990
Filed:
Jul. 17, 1989
Applicant:
Inventors:
Hazime Gotoh, Nagoya, JP;
Tadasi Yokoti, Nagoya, JP;
Assignee:
Mitsubishi Rayon Company, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D06C / ;
U.S. Cl.
CPC ...
28137 ; 28140 ; 26-1 ;
Abstract
Disclosed is a method wherein open spaces in woven fabrics useful as industrial materials, such as coated cloth and cloth for fiber-reinforced plastics, are reduced by allowing the woven fabrics to pass under pressure between a pair of rolls at least one of which vibrates in the axial direction thereof.
Gotoh, Hazime. (1990). Method of reducing open spaces in woven fabrics (U.S. Patent No. 4932107). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4932107
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile