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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 4931307 B1

PDFFull Text
Date of Patent:
Jun. 05, 1990

Filed:

Oct. 04, 1989

Method of correcting defect of patterned article

Applicant:
Inventors:

Toshio Sugita, Tachikawa, JP;

Hiroyuki Funamoto, Tokyo, JP;

Kazuyoshi Furuta, Tokyo, JP;

Osamu Koseki, Tokyo, JP;

Assignees:

Department of Electrical Engineering, Science University of Tokyo, both of, JP;

Seiko Instruments, Inc., both of, JP;

Attorneys:

Adams; Bruce L.

Wilks; Van C.

Primary Examiner:

Bernard Pianalto

Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 38 ; 156643 ; 427261 ; 427264 ; 427294 ; 427402 ; 427444 ;
Abstract

A method of correcting a missing defect of a patterned film formed on an icle is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the missing defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles, and directing a stream of the particles through the pin hole onto the area of the missing defect to deposit thereon a corrective film of the particles. A method of correcting a remaining defect of a patterned film formed on an article is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the remaining defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles and gas ions, and directing a stream of the particles and gas ions through the pin hole onto the area of the remaining defect to thereby remove therefrom a left patterned film to correct the remaining defect.

Find Patent Forward Citations

Sugita, Toshio. (1990). Method of correcting defect of patterned article (U.S. Patent No. 4931307). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4931307

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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