The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 1990
Filed:
Nov. 25, 1988
Applicant:
Inventor:
Eduard Pinkhasov, Eastchester, NY (US);
Assignee:
Vapor Technologies Inc., Mt. Vernon, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B / ;
U.S. Cl.
CPC ...
427 37 ; 427238 ; 427294 ;
Abstract
A method and apparatus for deep penetration deposition of material in a porous substrate utilizes a pressure differential across the substrate to effect penetration of arc-produced vapor from one chamber through the body. The one chamber can be held at a pressure of 10.sup.-2 to 10.sup.-3 torr while the other chamber is at a pressure of 10.sup.-5 to 10.sup.-6 torr.
Pinkhasov, Eduard. (1990). High penetration deposition process and apparatus (U.S. Patent No. 4931306). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4931306
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile