The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 1990
Filed:
Aug. 08, 1989
Applicant:
Inventors:
Rointan F Bunshah, Playa del Rey, CA (US);
Chandra V Deshpandey, Los Angeles, CA (US);
Aziz A Karim, Santa Monica, CA (US);
Assignee:
The Regents of the Univ. of Calif., Oakland, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419229 ; 20419212 ; 20429806 ; 20429811 ; 20429819 ;
Abstract
An apparatus and process for reactive magnetron sputtering wherein film deposition is controlled by placing a grid located over the primary plasma and an auxiliary plasma adjacent to the substrate. The auxiliary plasma is produced using a positively biased d.c. probe. Control of the deposited film properties is provided by varying the d.c. probe voltage and open area of the wire grid.
Bunshah, Rointan. (1990). Deposition of films onto large area substrates using modified reactive (U.S. Patent No. 4931158). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4931158
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile