The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 1990

Filed:

Apr. 29, 1988
Applicant:
Inventors:

Eli Ruckenstein, Amherst, NY (US);

Dennis B Chung, Upper Marlboro, MD (US);

Assignee:

State University of New York, Albany, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428520 ; 428522 ; 4332011 ; 523112 ; 523113 ; 523122 ; 523105 ; 604 16 ;
Abstract

A polymer article and a method for making the polymer article. The polymer article includes a hydrophobic polymer substrate and a block copolymer. The block copolymer has at least first and second blocks. The first block is more hydrophobic than the second block. The molecules of the block copolymer are secured into the surface of said substrate by means of the first block and at least a portion of the second block, outwardly extends from the surface of the substrate into the environment. The method for making the polymer article, comprising a block copolymer and a hydrophobic substrate, comprises the steps of: (a) forming a solution of a block copolymer and a solvent which will solubilize said block copolymer and swell said substrate. The block copolymer has at least a first and second block. The first block is more hydrophobic than the second; (b) treating a hydrophobic substrate with the solution for a sufficient time to swell the substrate surface and enable at least a part of the more hydrophobic block to be deposited on the substrate; (c) removing block copolymer deposited substrate from the solvent; and, (d) placing block copolymer deposited substrate in water for a predetermined time until said block copolymer is oriented such that the more hydrophobic block is entrapped in the substrate and the less hydrophobic block is exposed to water.


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