The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 1990

Filed:

Jun. 12, 1989
Applicant:
Inventor:

Michael L Levinthal, Marshall, TX (US);

Assignee:

Thiokol Corporation, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D / ;
U.S. Cl.
CPC ...
540475 ;
Abstract

Recovery of sulfuric and nitric acids from spent acid streams in a process for producing beta HMX in which hexamine, ammonia and acetic anhydride are reacted to produce DAPT, the DAPT is treated with a mixture of sulfuric and nitric acids to produce DADN which is then nitrolyzed with N.sub.2 O.sub.5 and anhydrous nitric acid to produce a HMX solution which is added to a dispersion of beta HMX seed crystals in water to selectively precipitate beta HMX from the HMX solution is accomplished by maintaining the DAPT/DADN spent acid stream separate from the HMX spent acid stream and treating the DAPT/DADN spent acid stream in a sulfuric acid recovery unit and treating the HMX spent acid stream in a magnesium nitrate nitric acid recovery unit.


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