The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 1990

Filed:

Aug. 08, 1988
Applicant:
Inventors:

Kenji Ohta, Nara, JP;

Junji Hirokane, Tenri, JP;

Akira Takahashi, Nara, JP;

Tetsuya Inui, Nara, JP;

Shohichi Katoh, Yamatokoriyama, JP;

Toshihisa Deguchi, Nara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430321 ; 430-5 ; 430 22 ; 430323 ; 430935 ;
Abstract

A method for manufacturing an optical memory element including the steps of disposing a resist film on a substrate, placing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate, forming a guide groove pattern latent image on the resist film, developing the guide groove pattern latent image formed on the resist film, conducting an etching operation through the developed guide groove pattern as to form guide grooves in the substrate, removing the resist film from the substrate, and disposing a recording medium layer on the substrate having the guide grooves formed therein.


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