The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 1990

Filed:

May. 01, 1989
Applicant:
Inventors:

Willem G Opheij, Eindhoven, NL;

Peter Coops, Eindhoven, NL;

Adrianus J Duijvestijn, Eindhoven, NL;

Dirk C Van Eck, Nijmegen, NL;

Peter De Zoeten, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
2502015 ; 369 4411 ;
Abstract

An optical scanning apparatus, which includes a radiation source (7) supplying a scaning beam (b.sub.1), an objective system (8) for focusing the scanning beam (b.sub.1) to a scanning spot (S.sub.1) in an information plane (2) to be scanned, and a first diffraction element (9) for deforming the beam reflected by the informatin plane (2) in such a way that a focus-error signal can be derived therefrom. The apparatus also includes a second diffraction element (10) for forming two auxiliary beams (b.sub.2, b.sub.3) by means of which a tracking-error signal can be derived, which second diffraction element has such a size and is arranged at such position that the beams originating from the first diffraction element (9) do not traverse the second diffraction element.


Find Patent Forward Citations

Loading…