The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 1990
Filed:
Jun. 12, 1987
Applicant:
Inventors:
Takeo Ohwada, Ibaraki, JP;
Kengo Kobayashi, Hitachi, JP;
Assignee:
Hitachi Chemical Co., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08L / ;
U.S. Cl.
CPC ...
525126 ; 525127 ; 525129 ; 525454 ; 525455 ; 525460 ; 525920 ;
Abstract
A graft copolymer produced by polymerizing an ethylenically unsaturated monomer in the presence of a fluorine-containing resin having reactive double bonds via a urethane linkage is excellent in transparency and pigment dispersibility and can provide a coating composition excellent in weather resistance.
Quick Actions:
Ohwada, Takeo. (1990). Process for producing graft copolymer (U.S. Patent No. 4923929). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4923929
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile