The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 1990
Filed:
Mar. 11, 1988
Teijin Limited, Osaka, JP;
Abstract
A solar cell having a layered structure with improved characteristics can be manufactured in plasma assisted CVD at a high rate deposition. In one aspect, separators are arranged between discharge electrodes to control a distribution of the composition of a reaction gas in a reaction chamber, giving a desired composition profile of a layer in the direction of the layer thickness. In another aspect, a grid electrode is inserted between a substrate and one of discharge electrodes only near an entrance portion thereof so that a high power can be applied to discharge electrodes to increase a deposition rate without plasma damage to an interface between a layer to be deposited and an underlying substrate. In a further aspect, an electric-field-adjusting means such as a metal wire is provided with an opening of a mask arranged between a substrate and one of the discharge electrodes for controlling the quality and layer thickness of a layer to be deposited. This electric-field adjusting means makes the electric field distribution uniform in the mask opening, thereby preventing a nonuniformity of the characteristics of a deposited layer.