The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 1990
Filed:
Jan. 28, 1988
David Isaacson, Latham, NY (US);
Rensselaer Polytechnic Institute, Troy, NY (US);
Abstract
A method and apparatus for an electric current computed tomography system having an array of electrodes determines the best pattern of currents to apply to the electrodes based on the precision of the system for distinguishing between a known conductivity in a body and an unknown conductivity. An arbitrary current pattern is first applied to the array, which is at the surface of the body. Measurements are then taken for the resulting voltage pattern of the unknown conductivity. Calculations are then made to determine the calculated voltage pattern for the selected conductivity. The absolute value of the difference between the calculated and measured voltage patterns are then taken and, from this, a new current pattern is calculated. If the difference between the new current pattern and the arbitrary current pattern is less than the precision of the system, the arbitrary current pattern is applied to the electrodes. More likely, however, the difference will be greater than the precision. In this case, the new current pattern is applied to the electrodes and the measurements and calculations are repeated to generate a still further new current pattern. The difference between the previous and the new current pattern is then taken and again compared to the precision of the system. By repeating this process, the best current pattern is eventually reached.