The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 1990
Filed:
Apr. 15, 1988
Applicant:
Inventors:
Eric R Fossum, Yorktown Heights, NY (US);
Peter D Kirchner, Garrison, NY (US);
George D Pettit, Mahopac, NY (US);
Alan C Warren, Peekskill, NY (US);
Jerry M Woodall, Bedford Hills, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 90 ; 148D / ; 148D / ; 148D / ; 148D / ; 148D / ; 156610 ; 437 78 ; 437107 ; 437133 ; 437228 ; 437974 ; 437947 ;
Abstract
Submicron structure fabrication is accomplished by providing vapor chemical erosion of a compound crystal by suppressing the more volatile elements so that the less volatile element is provided with an anti-agglomeration and erosion rate limiting capability which can be followed by subsequent regrowth in the same environment. The erosion is sensitive to crystallographic orientation.