The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 1990

Filed:

Feb. 23, 1988
Applicant:
Inventors:

Takanori Anazawa, Sakura, JP;

Kazuo Hasumi, Odawara, JP;

Yoshiyuki Ono, Sakura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264 22 ; 264 41 ; 264 461 ; 264 464 ; 264129 ; 264134 ; 264135 ; 2642093 ; 26421113 ; 264235 ; 2642356 ; 264346 ; 427172 ; 427322 ; 427421 ; 427429 ; 4274342 ;
Abstract

Method for producing a gas separation membrane comprising a microporous support having provided thereon a non-porous coating layer. The method comprises melt extruding a thermoplastic crystalline polymer under particular melt-extrusion conditions to form a precursor in the form of a hollow fiber or flat film, coating the precursor as a support with a coating substance composed of a natural or synthetic substance capable of forming a polymeric layer which does not form pinholes upon subsequent drawing after solidification to form a coating layer on the surface of the support, and solidifying the coating layer. The support is annealed either before or after the cooling process, and this is followed by cold drawing and heat setting the support to form the gas separation membrane.


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