The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 1990

Filed:

Dec. 27, 1988
Applicant:
Inventors:

Yasuo Hata, Sodegaura, JP;

Kenkichi Takahashi, Sodegaura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
55158 ; 55 16 ;
Abstract

The present invention provides a selective gas permeation membrane in which the inner walls of pores in a porous substrated are coated with organosiloxane polymer and voids are formed in the central portion of the pores. The selective gas permeation membrane is produced by impregnating the porous substrate with the siloxane polymer followed by a crosslinking treatment to such an extent that the penetration degree of the crosslinked organosiloxane polymer reaches a range from 20 to 150 and then removing the crosslinked organosiloxane polymer undergoing insufficient crosslinking by means of a solvent.


Find Patent Forward Citations

Hata, Yasuo. (1990). Selective gas permeation membranes and method of manufacturing them (U.S. Patent No. 4919694). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4919694

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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