Reusable evaporation fixture

Abstract

A reusable evaporation fixture for aligning a plurality of small individual substrates to a single contact mask is described. The fixture preferably includes a series of thin inner plates held together by a base plate and top plate. One of the inner plates includes a plurality of spring means corresponding to the plurality of individual substrates to be masked. Each spring means forces individual substrate against the contact mask to prevent haloing of the deposition pattern. Another of the inner plates has a plurality of pockets and spring means within those pockets which force the individual substrates against the alignment faces of the pockets, to align and secure the individual substrates in the X-Y plane. Once the individual substrates have been placed in the pockets provided by the inner plates, the contact mask is placed over the inner plates, and a top plate is placed over the entire assembly. The top plate shields the parts of the reusable evaporation fixture during deposition, so that only the top plate and the mask must be cleaned. The use of spring means in the inner plates compensates for dimensional tolerance between the individual substrates.