The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 1990

Filed:

Aug. 29, 1988
Applicant:
Inventors:

Shinichi Nakamura, Ichihara, JP;

Hideo Teshima, Ichihara, JP;

Eiichi Terada, Ichihara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528376 ; 528322 ; 528362 ; 528364 ; 528392 ;
Abstract

Novel styrene-based polymers and a process for efficient production thereof are disclosed. The styrene-based polymers have a branching nucleus represented by the general formula: R(S).sub.k or R(A-S).sub.k (wherein all the symbols are as defined in the appended claims), and have a sulfur content of 6 to 550 ppm, a weight average molecular weight of 450,000 to 1,300,000, and a weight average molecular weight/number average molecular weight (Mw/Mn) ratio of 2:1 to 15:1. The styrene-based polymers are greatly improved in impact resistance while maintaining sufficiently high fluidity and moldability and thus when injection or extrusion molded, can provide moldings having an excellent mechanical strength.


Find Patent Forward Citations

Nakamura, Shinichi. (1990). Styrene-based/polymercaptan polymer and process for production thereof (U.S. Patent No. 4918159). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4918159

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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