The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 1990
Filed:
Jan. 24, 1989
Masaaki Matsukawa, Hikone, JP;
Eiji Miyasaka, Hikone, JP;
Yoshio Sugimoto, Hikone, JP;
Masayuki Handa, Hikone, JP;
Morihiro Takeda, Hikone, JP;
Abstract
A multiple-exposure apparatus in a graphic arts copying machine of a slit-exposure type includes an original holding member mounted for horizontal reciprocating motion. An optical exposure system exposes an optical image of a slitwise segment of the original onto a photosensitive material. A moving device reciprocates the holding member and conveys the photosensitive material relative to the optical system. The moving device is adapted to synchronize the advance of the original holding member and the conveyance of the photosensitive material. A data setting device is provided for setting predetermined data concerning a predetermined multiple-exposure layout mode of the original onto the photosensitive material. A control unit controls the operation of the optical exposure system by enabling and disabling the exposure by the optical system and also synchronizes the moving device in an associated relationship as a function of the predetermined set data. Multiple-exposures of the original thus are made on the photosensitive material in the prederemined multiple-exposure layout mode.