The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 1990
Filed:
Jun. 17, 1988
Satoshi Sugita, Yokohama, JP;
Shotaro Okabe, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In the microwave plasma CVD apparatus according to the present invention, magnets are disposed at the outer circumference of the microwave introduction section thereby forming the magnetic field in the same direction as the direction of introducing the microwave to thereby prevent film deposition to the microwave introduction window. By the apparatus according to the present invention: (1) Microwave can be supplied to the inside of the vacuum chamber always under stabilized state, and (2) the maintenance frequency for the microwave introduction window of the microwave CVD apparatus can be increased.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile