The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 1990

Filed:

Aug. 05, 1988
Applicant:
Inventors:

Edward R Kafchinski, Winfield, NJ (US);

Herman L LaNieve, III, Warren, NJ (US);

Gordon W Calundann, North Plainfield, NJ (US);

Tai-Shung Chung, Randolph, NJ (US);

Assignee:

Hoechst Celanese Corporation, Somerville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M / ;
U.S. Cl.
CPC ...
429254 ; 264 49 ;
Abstract

Disclosed herein is a process for producing a polyhalogenated microporous film having a very narrow pore size distribution and good temperature and chemical resistance. The process involves blending a polyhalogenated copolymer having a very small particle size with a binder polymer utilizing a solvent which is a nonsolvent for the polyhalogenated copolymer but a solvent for the binder polymer, forming a film from the blend, drying the film, heating the film to a temperature at or above the melting point of the polyhalogenated copolymer and under conditions such that the microparticulate particles at their points of mutual contact will neck together to form a relatively continuous matrix and extracting the binder polymer from the film utilizing a solvent for the binder particle to form a microporous film.


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