The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 1990
Filed:
Jun. 09, 1988
Akira Sago, Nagoya, JP;
Masashi Ueda, Nagoya, JP;
Osamu Takagi, Nagoya, JP;
Yumio Matsumoto, Kasugai, JP;
Kiyoharu Hayakawa, Ama, JP;
Abstract
An exposure system for use in an image recording apparatus includes a photosensitive and pressure-sensitive recording sheet which is sensitive to light in a certain wavelength range. The exposure system also includes a light source disposed on one side of the photosensitive and pressure-sensitive recording medium for applying the light in the predetermined wavelength range to the photosensive and pressure-sensitive recording medium through a first original, and a space region disposed on said one side for accommodating therein an optional exposure unit for optionally exposing the photosensitive and pressure-sensitive recording medium through a second original. The light source is movable while applying the light to the photosensitive and pressure-sensitive recording medium through the first original. The exposure system also includes a rest area for resting the light source out of a light path along which the optional exposure unit exposes the photosensitive and pressure-sensitive recording medium through the second original.