The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 1990
Filed:
Sep. 15, 1987
Applicant:
Inventors:
Hiroshi Kobayashi, Hino, JP;
Taxay Sato, Hino, JP;
Hiroshi Menjo, Hino, JP;
Shinichi Nishi, Hino, JP;
Hideo Watanabe, Hino, JP;
Assignee:
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
357-4 ; 357-2 ; 357 15 ; 357 45 ;
Abstract
Disclosed are an active matrix element and a method of manufacturing the same, wherein two first electrode layers are formed on a substrate, semiconductor thin films are formed on regions including the two first electrode layers, respectively, a second electrode layer is formed on the semiconductor thin layers and constituting Schottky barriers between the semiconductor layers and the second electrode layer.