The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 1990

Filed:

Jul. 15, 1986
Applicant:
Inventor:

Rudolf Hurter, Basel, CH;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09B / ; C09B / ; C09B / ; D06P / ;
U.S. Cl.
CPC ...
534782 ; 534643 ; 534739 ; 534740 ; 534750 ; 534771 ; 534783 ; 534790 ; 534794 ; 534826 ; 534845 ; 534876 ; 534882 ;
Abstract

The present invention relates to monoazo dyes which dye polyamide material with good light- and wet-fastness and which have the formula ##STR1## in which K is the radical of an amino- or alkoxy-benzene, amino- or alkoxy-naphthalene, naphthol, aminonaphthol, pyrazolone, aminopyrazole, indole, naphthimidazole, diphenylamine, tetrahydroquinoline or acetoacetamide and can be further substituted, R is hydrogen, halogen, C.sub.1-6 -alkyl, trifluoromethyl, carboxyl or a --SO.sub.2 --C.sub.1-6 --alkyl, --SO.sub.2 --R.sub.1, ##STR2## --CO--R.sub.4 group, in which R.sub.1 is a substituted or unsubstituted phenyl- or naphthyl-C.sub.1-4 -alkyl radical, R.sub.2 and R.sub.3 independently of one another are hydrogen or a substituted or unsubstituted C.sub.1-6 -alkyl or C.sub.5-7 -cycloalkyl radical and R.sub.4 is a substituted or unsubstituted phenyl radical, and X is hydrogen, C.sub.1-4 -alkyl, C.sub.1-4 -alkoxy or halogen, and in which R in formula (1) may not be hydrogen or chlorine if the radical --N.dbd.N--K is bonded to the phenyl ring in the o-position relative to the --SO.sub.2 -- group and K is the radical of an aminonaphthalenesulfonamide or a 2-amino-8-hydroxynaphthalene-6-sulfonic acid.


Find Patent Forward Citations

Loading…